Lisle, IL, United States of America

Benjamin J Jurcik, Jr


Average Co-Inventor Count = 3.1

ph-index = 5

Forward Citations = 126(Granted Patents)


Location History:

  • Lisle, IL (US) (1995 - 2005)
  • Richardson, TX (US) (2010)
  • Tsukuba, JP (2014)

Company Filing History:


Years Active: 1995-2014

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8 patents (USPTO):

Title: Innovations and Contributions of Benjamin J Jurcik, Jr.

Introduction

Benjamin J Jurcik, Jr., based in Lisle, Illinois, is a notable inventor with a significant impact in the field of technology and engineering. With a portfolio that boasts eight patents, he has made strides in developing advanced methodologies and devices that enhance manufacturing processes, particularly in the semiconductor industry.

Latest Patents

Among Jurcik's latest innovations are two remarkable patents. The first is for "Neutral Ligand Containing Precursors and Methods for Deposition of a Metal Containing Film." This patent details methods and compositions for depositing metal films using precursor compounds comprised of gold, silver, or copper. His innovative approach utilizes neutral ligands derived from ethylene or acetylene, showcasing a significant advancement in chemical deposition techniques.

The second patent pertains to a "Chemical Storage Device with Integrated Load Cell." This invention describes a novel method for monitoring chemical usage through a transportable device that integrates a chemical storage canister with a load cell. The load cell continually displays the weight of the chemicals dispensed, compensating for additional weight from dispensing devices used in the semiconductor industry. This invention emphasizes efficiency and precision in chemical monitoring.

Career Highlights

Throughout his career, Benjamin J Jurcik, Jr. has worked with prominent companies, including American Air Liquide, Inc. His expertise and innovative spirit have positioned him as an influential figure in his domains of work, contributing to essential advancements in chemical processing and semiconductor manufacturing.

Collaborations

Jurcik has collaborated with notable individuals in his field, such as Hwa-Chi Wang and James J McAndrew. These collaborations have facilitated knowledge sharing and innovation, furthering the scope and impact of his inventions.

Conclusion

Benjamin J Jurcik, Jr.'s contributions to innovation through his patents are remarkable. His latest inventions enhance efficiency in chemical processes and metal deposition, marking significant advancements in the fields he engages with. As he continues to collaborate and innovate, Jurcik remains a key figure to watch in the landscape of technological advancements.

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