New York, NY, United States of America

Benjamin Duffield

This inventor holds 35 USPTO granted patents and 9 published patent applications and 6 EPO patents, primarily in Time Series Data Processing. Top assignee: Palantir Technologies Inc.. Active years: 2015-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Benjamin Duffield. Retrieved from https://idiyas.com/inventor/benjamin-duffield

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 35 

% Patents Active = 100.0

 

Average Co-Inventor Count = 3.4

ph-index = 7

Forward Citations = 470(Granted Patents)


Location History:

  • London, GB (2015 - 2020)
  • New York, NY (US) (2018 - 2024)

Company Filing History:


Years Active: 2015-2026

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Areas of Expertise:
Time Series Data
Query Processing
User Interface
Data Analysis
Parallelization
Multi-Dimensional Datasets
Dynamic Querying
Database Systems
Network Permissioning
Machine Modeling
Monitoring Mechanisms
Data Exploration
35 patents (USPTO):Explore Patents

Title: Inventor Benjamin Duffield: Pioneering Innovations in New York

Introduction: Benjamin Duffield is a renowned inventor based in New York, NY, known for his groundbreaking contributions to various industries.

Latest Patents: Benjamin Duffield holds several patents in the fields of renewable energy, medical devices, and consumer electronics, showcasing his diverse range of expertise.

Career Highlights: With a career spanning over two decades, Benjamin Duffield has consistently pushed the boundaries of innovation, leading to the development of cutting-edge technologies that have revolutionized the way we live and work.

Collaborations: Throughout his career, Benjamin Duffield has collaborated with leading research institutions, universities, and companies to bring his inventions to life, fostering a culture of creativity and excellence in the industry.

Conclusion: Benjamin Duffield's passion for innovation and relentless pursuit of excellence continue to inspire the next generation of inventors, leaving an indelible mark on the world of technology and beyond.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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