Ben Ma

Title: Ben Ma: Innovator in Digital Elevation Models and Building Shape Classification

Introduction

Ben Ma is a prominent inventor based in Lanzhou, China. He has made significant contributions to the fields of digital elevation model generation and building shape classification. With a total of 2 patents, his work showcases innovative methodologies that enhance the accuracy and efficiency of these processes.

Latest Patents

Ben Ma's latest patents include a "Method for multi-scale digital elevation model generation based on curvature wavelet transform." This method involves several steps, including obtaining a wavelet basis function and a wavelet decomposition layer number, acquiring grid surface curvature of DEM data, and performing resampling to achieve DEM generation and synthesis. Another notable patent is the "Classification method based on skeleton lines for map building shapes." This classification method expands a template library of buildings, constructs a least-squares template to avoid the influence of small depressions and protrusions, and calculates similarity between feature vectors of skeleton lines to classify building shapes effectively.

Career Highlights

Ben Ma is affiliated with Lanzhou Jiaotong University, where he applies his expertise in research and development. His innovative approaches have garnered attention in the academic community, contributing to advancements in geographic information systems and architectural design.

Collaborations

Ben collaborates with esteemed colleagues, including Haowen Yan and Jingzhong Li, who share his passion for innovation and research in their respective fields.

Conclusion

Ben Ma's contributions to the fields of digital elevation models and building shape classification highlight his role as a leading inventor. His innovative methodologies continue to influence advancements in technology and research.