This inventor holds 6 USPTO granted patents. Top assignees: Hon Hai Precision Industry Co., Ltd., Tsinghua University. Active years: 2015-2017.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:


Years Active: 2015-2017
Title: The Innovations of Ben-Feng Bai
Introduction
Ben-Feng Bai is a prominent inventor based in Beijing, China. He has made significant contributions to the field of engineering, particularly in the development of advanced materials. With a total of six patents to his name, Bai's work reflects a commitment to innovation and technological advancement.
Latest Patents
Among his latest patents is the "Hollow-structure metal grating." This invention features a substrate, several connecting metal layers, and multiple hollow metal protrusions that are strategically spaced on the substrate's surface. A space is defined between each hollow metal protrusion and the substrate, enhancing its structural integrity. Another notable patent is the "Method of manufacturing hollow-structure metal grating." This method outlines a series of steps, including providing a substrate, placing a metal layer on its surface, forming a patterned mask layer from a chemical amplified photoresist, plasma etching the exposed metal layer, and finally dissolving the patterned mask layer.
Career Highlights
Ben-Feng Bai has worked with esteemed institutions such as Tsinghua University and Hon Hai Precision Industry Co., Ltd. His experience in these organizations has allowed him to collaborate on various innovative projects, furthering his expertise in material science and engineering.
Collaborations
Bai has collaborated with notable colleagues, including Zhen-Dong Zhu and Qun-Qing Li. Their joint efforts have contributed to the advancement of technology in their respective fields.
Conclusion
Ben-Feng Bai's contributions to innovation and engineering are evident through his patents and collaborations. His work continues to influence the development of advanced materials and manufacturing processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile