Ben Chan

Title: The Innovations of Ben Chan

Introduction

Ben Chan is an accomplished inventor based in San Francisco, CA. He has made significant contributions to the field of semiconductor technology, particularly in the development of trench MOSFETs. His innovative approach has led to advancements that enhance the reliability and efficiency of electronic devices.

Latest Patents

Ben Chan holds a patent for "Thicker oxide formation at the trench bottom by selective oxide deposition." This invention involves creating a trench in a semiconductor substrate and forming a barrier layer over a portion of the trench's side wall. A thick insulating layer is then deposited at the bottom of the trench, which is designed to grow at a faster rate than on the barrier layer. This method effectively addresses stress and reliability issues associated with thermal growth of insulating layers, while also improving control over the shape and thickness of the insulating layer.

Career Highlights

Ben Chan is currently employed at Siliconix Incorporated, where he continues to push the boundaries of semiconductor technology. His work has been instrumental in developing more efficient electronic components that are crucial for modern devices. With a total of 1 patent, he has established himself as a key player in his field.

Collaborations

Ben has collaborated with talented colleagues such as Kam Hong Lui and Christiana Yue. Their combined expertise has fostered an environment of innovation and creativity at Siliconix Incorporated.

Conclusion

Ben Chan's contributions to semiconductor technology exemplify the spirit of innovation that drives the industry forward. His patent on trench MOSFET technology showcases his commitment to enhancing the performance and reliability of electronic devices.