Location History:
- Koashuing, TW (2000)
- Koasuing, TW (2000)
Company Filing History:
Years Active: 2000
Title: Innovations of Been-Hon Lin in Microelectronics
Introduction
Been-Hon Lin is a notable inventor based in Koashuing, Taiwan. He has made significant contributions to the field of microelectronics, particularly in the development of advanced chemical vapor deposition methods. With a total of 2 patents, his work has had a substantial impact on the manufacturing processes used in semiconductor fabrication.
Latest Patents
Among his latest patents, Lin has developed a "Pre deposition stabilization method for forming a void free" dielectric layer. This innovative chemical vapor deposition (CVD) method is designed for creating a doped silicate glass dielectric layer within microelectronics fabrication. The process involves stabilizing a silicon source material flow within a reactor chamber, followed by the deposition of the doped silicate glass dielectric layer. This method ensures that the dielectric layer is formed without voids, enhancing the reliability of microelectronic devices.
Another significant patent is the "Process for forming a sausg inter metal dielectric layer by pre-coating." This method focuses on manufacturing an insulating layer with a uniform etch rate, which improves the profiles of via/contact openings. By forming a silicon oxide coating film over the chamber walls of a CVD reactor, Lin's method enhances the etch rate uniformity of the insulating layer, which is crucial for the performance of semiconductor structures.
Career Highlights
Lin is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he continues to innovate in the field of semiconductor manufacturing. His expertise in chemical vapor deposition techniques has positioned him as a key contributor to advancements in microelectronics.
Collaborations
Throughout his career, Been-Hon Lin has collaborated with esteemed colleagues, including Bing-Huei Peng and Chung-Chieh Liu. These collaborations have further enriched his research and development efforts in the semiconductor industry.
Conclusion
Been-Hon Lin's contributions to microelectronics through his innovative patents and collaborative efforts highlight his importance in the field. His work continues to influence the manufacturing processes that are essential for modern electronic devices.