Bastien Bruneau

Title: Bastien Bruneau: Innovator in Plasma Processing Technologies

Introduction

Bastien Bruneau is a notable inventor based in Paris, France. He has made significant contributions to the field of plasma processing, holding 2 patents that showcase his innovative approach to technology.

Latest Patents

One of his latest patents is titled "Apparatus and method for patterned processing." This invention includes an apparatus designed for patterned processing, featuring a source of input gas, a source of energy for generating plasma, and a grounded sample holder for solid samples. The apparatus incorporates a mask positioned between the plasma region and the sample holder, which is designed to create spatially selective patterned processing on the surface of the solid sample.

Another significant patent is the "Method and system for controlling ion flux in an RF plasma." This method generates ion flow asymmetry in a capacitively coupled radiofrequency plasma reactor. It involves energizing a first electrode with a specific radiofrequency voltage waveform, which leads to an asymmetry of ion flows between two electrodes.

Career Highlights

Bastien Bruneau has worked with prestigious organizations such as the Centre National de la Recherche Scientifique and Total SA. His experience in these institutions has allowed him to refine his skills and contribute to groundbreaking research in plasma technologies.

Collaborations

Throughout his career, Bastien has collaborated with talented individuals, including Erik Johnson and Tatiana Novikova. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Bastien Bruneau is a distinguished inventor whose work in plasma processing technologies has led to significant advancements in the field. His patents reflect his commitment to innovation and his ability to address complex challenges in technology.