The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 07, 2023
Filed:
May. 18, 2018
Total SA, Courbevoie, FR;
Ecole Polytechnique, Palaiseau, FR;
Centre National DE LA Recherche Scientifique, Paris, FR;
Bastien Bruneau, Paris, FR;
Erik Johnson, Paris, FR;
Pavel Bulkin, Villebon sur Yvette, FR;
Nada Habka, Bourg la Reine, FR;
Gilles Poulain, Palaiseau, FR;
Nacib Benmammar, Romainville, FR;
TOTAL SA, Courbevoie, FR;
ECOLE POLYTECHNIQUE, Palaiseau, FR;
CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE, Paris, FR;
Abstract
An apparatus for patterned processing includes a source of input gas, a source of energy suitable for generating a plasma from the input gas in a plasma region and a grounded sample holder configured for receiving a solid sample. The apparatus includes a mask arranged between the plasma region and the grounded sample holder, the mask having a first face oriented toward the plasma region and a second face oriented toward a surface of the solid sample to be processed, the mask including a mask opening extending from the first face to the second face, and an electrical power supply adapted for applying a direct-current bias voltage to the mask, and the mask opening being dimensioned and shaped so as to generate spatially selective patterned processing on the surface of the solid sample.