Company Filing History:
Years Active: 2019
Title: Baskar Pagadala Gopi: Innovator in CVD Technology
Introduction
Baskar Pagadala Gopi is a notable inventor based in Aachen, Germany. He has made significant contributions to the field of chemical vapor deposition (CVD) technology. With a total of 3 patents, Gopi has developed innovative solutions that enhance the efficiency and effectiveness of gas supply systems in CVD processes.
Latest Patents
Gopi's latest patents include a temperature-controlled gas supply line with dilution gas flows supplied at multiple locations. This invention features a process gas source with a temperature-controlled evaporator and a carrier gas supply line that opens into the evaporator. The design allows for a dilution gas flow to be supplied into the first transport line, ensuring optimal conditions for layer deposition on substrates. Another significant patent is the gas inlet element of a CVD reactor with a weight-reduced gas outlet plate. This device improves production aspects by utilizing a porous material for the gas outlet plate, which enhances the distribution of process gases in the reactor.
Career Highlights
Gopi is currently employed at Aixtron SE, a company renowned for its advancements in CVD technology. His work focuses on developing innovative devices that streamline the deposition processes used in various applications, including semiconductor manufacturing.
Collaborations
Gopi collaborates with esteemed colleagues such as Martin Dauelsberg and Markus Gersdorff. Their combined expertise contributes to the ongoing development of cutting-edge technologies in the field.
Conclusion
Baskar Pagadala Gopi is a prominent figure in the realm of CVD technology, with a proven track record of innovation and collaboration. His contributions continue to shape the future of gas supply systems in the industry.