Fremont, CA, United States of America

Basanta Bhaduri

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Tokyo Electron Limited. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Basanta Bhaduri. Retrieved from https://idiyas.com/inventor/basanta-bhaduri-47xip19o

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Basanta Bhaduri

Introduction

Basanta Bhaduri is a notable inventor based in Fremont, California. He has made significant contributions to the field of metrology integrated with vacuum processing. His innovative work has led to the development of a unique system that enhances the efficiency of wafer processing.

Latest Patents

Basanta Bhaduri holds 1 patent for his invention titled "Metrology integrated with vacuum processing." This patent describes a system that includes a vacuum chamber with a wafer chuck and slanted side windows. The design allows for improved illumination and collection optics, which are essential for accurate measurements during the wafer processing.

Career Highlights

Bhaduri is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His role involves advancing technologies that improve the precision and effectiveness of wafer processing systems. His expertise in metrology has positioned him as a valuable asset to his team.

Collaborations

One of his notable coworkers is Holger Tuitje, with whom he collaborates on various projects aimed at enhancing vacuum processing technologies. Their combined efforts contribute to the ongoing innovation within their field.

Conclusion

Basanta Bhaduri's work exemplifies the spirit of innovation in the semiconductor industry. His contributions through his patent and collaboration with colleagues continue to push the boundaries of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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