Bas M Mertens

Title: Bas M Mertens: Innovator in EUV Lithography

Introduction

Bas M Mertens is a notable inventor based in Den Haag, Netherlands. He has made significant contributions to the field of EUV lithography, particularly in the area of optical element contamination prevention and cleaning methods. With a total of 2 patents, Mertens continues to push the boundaries of innovation in his field.

Latest Patents

Mertens' latest patents include a device and method for preventing and cleaning contamination on optical elements. This invention relates to a method for preventing contamination on the surfaces of optical elements comprising a multi-layer system during exposure to radiation at signal wavelengths in an evacuated closed system with a residual gas atmosphere. The method involves measuring the photocurrent generated by photo emission from the radiated surface of the multi-layer system. This photocurrent is then used to regulate the gas composition of the residual gas, altering it according to at least one lower and one upper threshold value of the photocurrent. The invention also encompasses a device for regulating contamination on the surface of optical elements during exposure and a method for cleaning surfaces contaminated by carbon.

Career Highlights

Bas M Mertens is currently employed at Carl Zeiss SMT AG, where he applies his expertise in lithography and optical systems. His work has been instrumental in advancing technologies that are critical to the semiconductor manufacturing process.

Collaborations

Mertens has collaborated with notable colleagues such as Marco Wedowski and Frank Stietz, contributing to various projects that enhance the capabilities of EUV lithography.

Conclusion

Bas M Mertens is a prominent figure in the field of EUV lithography, with innovative patents that address critical challenges in optical element contamination. His work at Carl Zeiss SMT AG and collaborations with esteemed colleagues further solidify his impact on the industry.