Ottobrunn, France

Barbara Jeansannetas

This inventor holds 1 USPTO granted patent. Top assignee: Infineon Technologies Ag. Active years: 2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Barbara Jeansannetas. Retrieved from https://idiyas.com/inventor/barbara-jeansannetas

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Barbara Jeansannetas: Innovator in Sputter Technology

Introduction

Barbara Jeansannetas is a notable inventor based in Ottobrunn, France. She has made significant contributions to the field of sputter technology, particularly with her innovative designs and patents. Her work has implications in various applications, showcasing her expertise and dedication to advancing technology.

Latest Patents

Barbara holds a patent for a "Backing plate for a sputter target, sputter target, and sputter device." This invention features a target receiving part designed to accommodate a target to be sputtered, along with a structure that exposes the target receiving part through the backing plate. This innovation enhances the efficiency and effectiveness of sputtering processes.

Career Highlights

Barbara is currently employed at Infineon Technologies AG, a leading company in semiconductor solutions. Her role at Infineon allows her to work on cutting-edge technologies and contribute to the development of advanced materials and devices. With her patent portfolio, she has established herself as a key player in her field.

Collaborations

Throughout her career, Barbara has collaborated with esteemed colleagues such as Markus Fischer and Wolfram Karcher. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Barbara Jeansannetas exemplifies the spirit of innovation in the field of sputter technology. Her contributions through patents and collaborations highlight her commitment to advancing technology and improving industry standards.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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