Company Filing History:
Years Active: 2025
Title: Bar Dubovski - Innovator in Semiconductor Examination
Introduction
Bar Dubovski is an innovative inventor based in Beit Hashmonay, Israel. She has made significant contributions to the field of semiconductor examination through her latest patent applications. Although she currently holds no granted patents, her work in machine learning applications for defect detection showcases her expertise and forward-thinking approach.
Latest Patent Applications
Bar Dubovski's latest patent applications include:
1. **Machine Learning Based Defect Examination for Semiconductor Specimens** - This application describes a system and method for examining semiconductor specimens. The method involves obtaining multiple images of a semiconductor specimen and processing these images using a machine learning model for defect detection. The model is trained on a combination of synthetic defective images and nominal images to improve detection performance.
2. **Optimal Determination of an Overlay Target Using Machine Learning** - This application outlines systems and methods for selecting optimal overlay targets in semiconductor manufacturing. It involves obtaining design images of overlay targets and using a trained machine learning model to simulate images that would be captured by an electron beam examination system. This process helps in determining the best overlay target before actual manufacturing.
Conclusion
Bar Dubovski is a promising inventor whose work in machine learning for semiconductor examination holds great potential for the industry. Her innovative approaches aim to enhance defect detection and optimize manufacturing processes.