Bao Nguyen

Title: Innovations of Bao Nguyen in Sputtering Technology

Introduction

Bao Nguyen is an accomplished inventor based in Sunnyvale, CA. He has made significant contributions to the field of sputtering technology, particularly through his innovative methods and apparatuses. His work has implications for various applications in materials science and engineering.

Latest Patents

One of Bao Nguyen's notable patents is titled "Apparatus and method of forming a sputtering target." This invention provides a method and apparatus for forming a sputtering target that includes a copper indium gallium sputtering target material on a backing structure. The sputtering target is formed by compressing pre-alloyed and atomized powders of Cu, In, and Ga at pressures below 35,000 psi. In some embodiments, the sputtering target material contains Na, S, or Se. Additionally, in other embodiments, the sputtering target is formed by isothermal compression. This patent showcases his expertise in developing advanced materials for sputtering applications.

Career Highlights

Bao Nguyen is currently employed at Apollo Precision Fujian Limited, where he continues to innovate and contribute to the field. His work at the company has allowed him to explore new technologies and refine existing processes. With a patent portfolio that includes 1 patent, he has established himself as a key figure in his area of expertise.

Collaborations

Bao has collaborated with talented individuals such as Daniel R Juliano and Kedar Hardikar. These partnerships have fostered a creative environment that encourages the exchange of ideas and advancements in technology.

Conclusion

In summary, Bao Nguyen is a notable inventor whose work in sputtering technology has led to significant advancements in the field. His innovative methods and collaborations continue to shape the future of materials science.