The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 2015
Filed:
Jan. 23, 2012
Daniel R. Juliano, Santa Clara, CA (US);
Bao Nguyen, Sunnyvale, CA (US);
Kedar Hardikar, Santa Clara, CA (US);
Daniel R. Juliano, Santa Clara, CA (US);
Bao Nguyen, Sunnyvale, CA (US);
Kedar Hardikar, Santa Clara, CA (US);
Abdelouahab Ziani, Santa Clara, CA (US);
APOLLO PRECISION FUJIAN LIMITED, Quanzhou, CN;
Abstract
A method and apparatus for forming a sputtering target are provided that includes a copper indium gallium sputtering target material on a backing structure. The sputtering target is formed by compressing pre-alloyed and atomized powders of Cu, In, and Ga at pressures below 35,000 psi. In some embodiments the sputtering target material contains Na, S, or Se. In other embodiments the sputtering target is formed by isothermal compression.