Bang-Chien Ho

Title: Bang-Chien Ho: Innovator in Photoresist Technology

Introduction

Bang-Chien Ho is a prominent inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of photoresist technology, holding a total of 4 patents. His work focuses on innovative methods that enhance the precision and efficiency of semiconductor manufacturing processes.

Latest Patents

One of his latest patents is titled "Water Soluble Negative Tone Photoresist." This method describes a technique for reducing the space width of holes in a first resist pattern while simultaneously removing unwanted holes to adjust the pattern density in the resulting second pattern. The technique allows for holes with a uniform space width as small as 100 nm or less, independent of the pattern density in the second pattern. A positive resist is patterned to create holes with a specific pattern density and space width. A water-soluble negative resist is then coated over the first resist and selectively exposed to form a second patterned layer. This layer consists of water-insoluble plugs in unwanted holes and a thin water-insoluble layer on the first resist pattern in unexposed portions. The resulting plugs can form dense and isolated hole arrays, while the thin insoluble layer reduces the space width in the remaining holes.

Another notable patent is "Complementary Replacement of Material." This image reversal method eliminates the etch resistance requirement from a resist. A high-resolution resist pattern is formed with a large process window by exposing through one or more masks, including phase edge masks. A complementary material replacement (CMR) layer, made of an organic polymer or material such as fluorosilicate glass, is coated over the resist pattern. Both the CMR and resist layers are etched simultaneously to create an image-reversed pattern in the CMR layer, which is then transferred into a substrate. This method avoids edge roughness and is beneficial for applications such as forming contact holes in dielectric layers and trenches in a damascene process.

Career Highlights

Bang-Chien Ho is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he continues to innovate in the field of semiconductor technology. His work has significantly impacted the efficiency and effectiveness of manufacturing processes in the industry.

Collaborations

He has collaborated with notable coworkers, including Jian-Hong Chen and Hua-Tai Lin, contributing to advancements in photoresist technology.

Conclusion