Balamurugan Deivendran

Title: Balamurugan Deivendran: Advancing Chemical Vapor Deposition

Introduction

Balamurugan Deivendran is an inventor based in Pune, India, whose patent work addresses process control and film deposition in chemical vapor deposition (CVD). His disclosed invention focuses on improving the yield, uniformity, and deposition rate of transition metal dichalcogenide films.

Latest Patents

Deivendran is associated with 1 patent, titled “Methods and Systems for Real-Time Optimization and Control of Substrate in Motion Chemical Vapor Deposition.” The patent describes moving substrates within a horizontal CVD reactor by reciprocating, rotating, revolving, or oscillating them in horizontal or vertical directions. This movement exposes more substrate surface area to flowing precursors, with the aim of improving deposition rates and process performance.

The disclosure also describes using computational fluid dynamics, machine learning, and optimization to investigate process parameters and develop recommended reactor settings. These methods are intended to help address challenges in achieving consistent film yield and uniformity.

Career Highlights

Deivendran works at Tata Consultancy Services Limited. His patent reflects an application of computational modeling and optimization to materials processing and reactor control.

Collaborations

The patent’s listed coworkers include Vishnu Swaroopji Masampally and Venkataramana Runkana. Their association reflects collaborative work connected with the disclosed CVD methods and systems.

Conclusion

Balamurugan Deivendran’s patent combines substrate motion, process analysis, and optimization to address deposition performance in CVD reactors.