Baibing Ni

Title: Baibing Ni: Innovator in Capacitor Technology

Introduction

Baibing Ni is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of capacitor technology, particularly through his innovative methods for fabricating capacitor devices. His work has implications for improving the reliability and efficiency of electronic components.

Latest Patents

Baibing Ni holds a patent for "Capacitor devices and fabrication methods thereof." This patent describes a method for fabricating a capacitor device that includes providing a substrate, forming a first-layer electrode on the substrate, and creating a conductive layer on the first-layer electrode. The method emphasizes reducing the roughness of the bottom electrode, which enhances the breakdown electric voltage and minimizes leakage current. This advancement significantly improves the reliability of capacitor devices.

Career Highlights

Throughout his career, Baibing Ni has worked with notable companies in the semiconductor industry. He has been associated with Semiconductor Manufacturing International (Shanghai) Corporation and Semiconductor Manufacturing International (Beijing) Corporation. His experience in these organizations has allowed him to develop and refine his innovative approaches to capacitor technology.

Collaborations

Baibing Ni has collaborated with esteemed colleagues, including Lianfeng Hu and Youcun Hu. These collaborations have contributed to the advancement of technology in the semiconductor field.

Conclusion

Baibing Ni's contributions to capacitor technology through his innovative patent and career in the semiconductor industry highlight his role as a key inventor. His work continues to influence the reliability and efficiency of electronic components.