This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Beijing Naura Microelectronics Equipment Co., Ltd.. Active years: 2021.
Company Filing History:
Years Active: 2021
Title: Bai Yang - Innovator in Plasma Processing Technology
Introduction
Bai Yang is a prominent inventor based in Beijing, China. He has made significant contributions to the field of plasma processing technology. His innovative work has led to the development of a unique plasma processing apparatus that addresses critical challenges in the industry.
Latest Patents
Bai Yang holds 1 patent for his invention titled "Plasma processing apparatus." This apparatus includes a chamber and a target positioned above the chamber. The design features an insulating sub-chamber and a conductive sub-chamber, which are superposed to enhance functionality. The insulating sub-chamber is constructed from insulating material, while the conductive sub-chamber is made of metal. A Faraday shield component is integrated into the insulating sub-chamber to mitigate wafer contamination caused by particles during the sputtering process.
Career Highlights
Bai Yang is currently employed at Beijing Naura Microelectronics Equipment Co., Ltd. His role at the company allows him to apply his expertise in plasma processing technology. His innovative contributions have positioned him as a key figure in the advancement of microelectronics equipment.
Collaborations
Bai Yang collaborates with notable colleagues, including Gang Wei and Peijun Ding, who contribute to the innovative environment at their workplace.
Conclusion
Bai Yang's work in plasma processing technology exemplifies the spirit of innovation. His contributions are paving the way for advancements in microelectronics, showcasing the importance of inventive solutions in modern technology.