Singapore, Singapore

Ba Tuan Pham

This inventor holds 1 USPTO granted patent. Top assignee: Chartered Semiconductor Manufacturing Ltd (Corporation). Active years: 2003.


% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2003

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1 patent (USPTO):Explore Patents

Title: Ba Tuan Pham: Innovator in Semiconductor Technology

Introduction

Ba Tuan Pham is a notable inventor based in Singapore, recognized for his contributions to semiconductor technology. He has developed innovative methods that enhance the fabrication processes of integrated circuits. His work is particularly significant in the field of metal etching, where precision and efficiency are paramount.

Latest Patents

Ba Tuan Pham holds a patent for a method to reduce microloading in metal etching. This innovative technique describes a process for etching metal lines with a minimized microloading effect. The method involves semiconductor device structures that are covered with an insulating layer, followed by the deposition of a barrier metal layer and a metal layer. The process includes the use of a photoresist mask with varying widths, allowing for selective etching that ensures the integrity of the metal lines during the fabrication of integrated circuits.

Career Highlights

Ba Tuan Pham is currently employed at Chartered Semiconductor Manufacturing Ltd, a leading corporation in the semiconductor industry. His work has significantly impacted the efficiency and quality of semiconductor manufacturing processes. With a focus on innovation, he continues to push the boundaries of technology in his field.

Collaborations

Throughout his career, Ba Tuan Pham has collaborated with esteemed colleagues such as Paul Kwok Keung Ho and Thomas Schulue. These collaborations have fostered an environment of innovation and have contributed to the advancement of semiconductor technologies.

Conclusion

Ba Tuan Pham is a distinguished inventor whose work in semiconductor technology has led to significant advancements in metal etching processes. His innovative methods continue to influence the industry, showcasing the importance of research and development in technology.

Profile summary based on public USPTO records.
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