Ayako Tani

Title: Ayako Tani: Innovator in Mask Blank Technology

Introduction

Ayako Tani is a prominent inventor based in Tokyo-to, Japan. She has made significant contributions to the field of mask blank technology, particularly in the production methods for phase shift masks. With a total of 2 patents, her work is crucial for advancements in lithography techniques.

Latest Patents

Tani's latest patents include innovative designs for mask blanks that enhance the efficiency and effectiveness of lithography processes. One of her notable inventions is a mask blank that features a transparent substrate and a half-transparent layer designed to control the phase and transmittance of exposure light. This invention is particularly useful for producing half-tone type phase shift masks, which are essential for high-resolution lithography on wafers. Another patent focuses on a mask blank with a negative resist film, which is specifically designed for use with ArF excimer laser exposure light. This invention includes a light semitransmissive layer that optimizes the performance of the mask blank in terms of transmittance and refractive index.

Career Highlights

Ayako Tani is currently employed at Dai Nippon Printing Co., Ltd., where she continues to innovate in the field of mask technology. Her work has been instrumental in improving the light-shielding properties and chemical resistance of mask blanks, making them suitable for advanced lithography techniques.

Collaborations

Throughout her career, Tani has collaborated with notable colleagues such as Hiroshi Watanabe and Katsuya Hayano. These collaborations have further enriched her research and development efforts in the field.

Conclusion

Ayako Tani's contributions to mask blank technology have positioned her as a key figure in the advancement of lithography techniques. Her innovative patents reflect her commitment to enhancing the capabilities of mask production, making significant strides in the industry.