Ziona, Israel

Avner Karpol


Average Co-Inventor Count = 3.6

ph-index = 9

Forward Citations = 402(Granted Patents)


Location History:

  • Nos Ziona, IL (2004)
  • Nes Ziona, IL (2001 - 2006)
  • Ziona, IL (2002 - 2008)

Company Filing History:


Years Active: 2001-2008

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12 patents (USPTO):Explore Patents

Introduction

Avner Karpol is an accomplished inventor based in Ziona, IL, recognized for his innovations in semiconductor inspection technologies. With a remarkable portfolio consisting of 12 patents, Karpol has made significant contributions to the field, focusing on methods and apparatuses that enhance the inspection process for various articles used in semiconductor manufacturing.

Latest Patents

Among his latest patents, Karpol developed a groundbreaking "Method and apparatus for article inspection including speckle reduction." This innovative method aims to reduce speckle during the inspection of articles such as wafers, masks, photomasks, and reticles. The technique involves manipulating light beams emitted from coherent light sources, like pulsed lasers, by integrating optical components such as fiber bundles, gratings, and acousto-optic modulators to achieve improved inspection quality.

Another significant patent is the "Method and apparatus for reticle inspection using aerial imaging." This reticle inspection system serves dual purposes: functioning as an incoming inspection tool and as a pre-exposure inspection solution. It is notably compatible with mask shops, enabling detection of line width errors and surface defects. The clever approach involves capturing images of the reticle under the same optical conditions as exposure, thereby ensuring high accuracy in defect detection.

Career Highlights

Throughout his career, Avner Karpol has worked with notable companies, including Applied Materials, Inc., and Talia Technology Ltd. His experience in these organizations has enabled him to refine his expertise in semiconductor technology and enhance his inventive skills.

Collaborations

Karpol's journey as an inventor has also led to collaborations with esteemed colleagues, including Boaz Kenan and Silviu Reinhorn. Together, they have contributed to advancing the field of semiconductor inspection, fostering innovation and implementing practical solutions to industry challenges.

Conclusion

Avner Karpol stands out as a leading figure in the innovation of semiconductor inspection technologies. His inventive spirit, reflected in his numerous patents, continues to influence the field, ensuring improved quality and efficiency in semiconductor manufacturing processes. As the industry evolves, Karpol's contributions will undoubtedly pave the way for future advancements.

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