Location History:
- Rishon Le Zion, IL (2009)
- Nes Ziona, IL (2011 - 2017)
Company Filing History:
5 out of 537 
1 out of 13,759 
Years Active: 2009-2017
Title: Aviram Tam: Innovator in Aerial Mask Inspection Technologies
Introduction
Aviram Tam is a notable inventor based in Nes Ziona, Israel. He has made significant contributions to the field of aerial mask inspection technologies, holding a total of six patents. His work focuses on enhancing the efficiency and accuracy of lithography processes through innovative analysis systems.
Latest Patents
Aviram Tam's latest patents include an "Aerial Mask Inspection Based Weak Point Analysis" system. This analysis system features a processor and a memory module designed to store aerial images of a mask area. Each aerial image corresponds to a focus value from a set of different focus values. The processor identifies weak points by processing these aerial images using various printability thresholds. Additionally, it determines focus and exposure values for generating a Process Window Qualification (PWQ) wafer based on the weak points identified. Another significant patent is the "Detection of Weak Points of a Mask," which involves an inspection system and a computer program product. This system obtains aerial images representing expected images formed on a photoresist during lithography. It searches for weak points in the mask area, focusing on local extremum points and crossing points of the printability threshold.
Career Highlights
Aviram Tam has worked with prominent companies in the industry, including Applied Materials Israel Limited and Applied Materials, Inc. His experience in these organizations has allowed him to develop and refine his innovative technologies.
Collaborations
Throughout his career, Aviram has collaborated with talented individuals such as Ovadya Menadeva and Colin David Chase. These collaborations have contributed to the advancement of his projects and the successful implementation of his inventions.
Conclusion
Aviram Tam is a distinguished inventor whose work in aerial mask inspection technologies has made a significant impact on the lithography field. His innovative patents and collaborations highlight his commitment to advancing technology and improving manufacturing processes.