Kashiwa, Japan

Atsushi Ohkuma

This inventor holds 1 USPTO granted patent. Top assignee: Seiko Epson Corporation. Active years: 2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Atsushi Ohkuma. Retrieved from https://idiyas.com/inventor/atsushi-ohkuma

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 8.0

ph-index = 1

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 2006

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1 patent (USPTO):Explore Patents

Title: Innovations by Atsushi Ohkuma

Introduction

Atsushi Ohkuma is a notable inventor based in Kashiwa, Japan. He has made significant contributions to the field of semiconductor technology. His work focuses on improving the efficiency and accuracy of hardware and software co-verification methods.

Latest Patents

Atsushi Ohkuma holds a patent for a "Method for co-verifying hardware and software for a semiconductor device." This innovative method achieves fast simulation execution by implementing a C-based native code simulation without degrading the accuracy of timing verification. The process involves using a host CPU to co-verify hardware and software components, ensuring that the verification models are accurately compiled and linked for effective simulation.

Career Highlights

Atsushi Ohkuma is currently employed at Seiko Epson Corporation, where he continues to develop cutting-edge technologies. His expertise in semiconductor devices has positioned him as a key player in the industry. His contributions have been instrumental in advancing the capabilities of hardware/software co-verification.

Collaborations

Atsushi has collaborated with notable colleagues such as Hiroyuki Yamashita and Takao Shinsha. Their combined efforts have led to significant advancements in their respective fields.

Conclusion

Atsushi Ohkuma's innovative work in semiconductor technology exemplifies the importance of effective hardware and software co-verification methods. His contributions continue to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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