This inventor holds 1 USPTO granted patent. Top assignees: Anelva Co., Toto Ltd.. Active years: 1996.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:

Years Active: 1996
Title: Atsushi Obara: Innovator in Semiconductor Technology
Introduction
Atsushi Obara is a notable inventor based in Fukuoka, Japan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative designs and patents. His work has been instrumental in advancing the efficiency and effectiveness of semiconductor manufacturing processes.
Latest Patents
Atsushi Obara holds a patent for an electrostatic chuck, which is designed for electrostatically clamping semiconductor wafers. This invention minimizes any plane temperature difference while ensuring effective clamping. The electrostatic chuck features a dielectric layer joined to a metal plate, with an inner electrode positioned within the dielectric layer. The design includes a raised outer rim along the upper surface and a series of protrusions that directly contact the semiconductor wafer. The dielectric layer's volume resistivity is 109 Ω·m or less, with specific measurements for the clamping surfaces of the protrusions, ensuring optimal performance. This patent highlights his innovative approach to improving semiconductor wafer handling.
Career Highlights
Throughout his career, Atsushi Obara has worked with prominent companies such as Toto Ltd. and Anelva Co. His experience in these organizations has allowed him to develop and refine his inventions, contributing to advancements in semiconductor technology.
Collaborations
Atsushi has collaborated with notable colleagues, including Tetsuo Kitabayashi and Jun Miyagi. These partnerships have fostered a creative environment that has led to significant technological advancements.
Conclusion
Atsushi Obara's contributions to semiconductor technology through his innovative patent and collaborative efforts have made a lasting impact in the field. His work continues to influence the industry and inspire future innovations.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile