Company Filing History:
2 out of 15 
1 out of 21,351 
1 out of 14 
Years Active: 1997-1999
Title: Atsushi Hayashi: Innovator in Photomask Technology
Introduction
Atsushi Hayashi is a notable inventor based in Chichibu, Japan. He has made significant contributions to the field of photomask technology, holding a total of 3 patents. His work focuses on the development of advanced materials and methods for photomask production.
Latest Patents
Hayashi's latest patents include a phase-shifting photomask blank and a method of manufacturing the same. The phase-shifting photomask blank is created by sputtering a target of molybdenum silicide with a sputtering gas that includes nitric monoxide in a specific volume ratio. A nitrided-oxide film of molybdenum silicide is formed on a transparent substrate, enhancing the photomask's performance. Additionally, a base phase-shifting film may be applied to the substrate, followed by the formation of a nitrided-oxide film as a surface layer. The transparent substrate can undergo heat treatment at temperatures of 200 degrees Celsius or higher to optimize the film properties.
Career Highlights
Throughout his career, Atsushi Hayashi has worked with prominent companies such as Ulvac Coating Corporation and Mitsubishi Denki Kabushiki Kaisha. His experience in these organizations has allowed him to refine his expertise in photomask technology and contribute to innovative solutions in the industry.
Collaborations
Hayashi has collaborated with notable colleagues, including Akihiko Isao and Susumu Kawada. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Atsushi Hayashi's contributions to photomask technology through his patents and career achievements highlight his role as a key innovator in the field. His work continues to influence advancements in photomask production and materials science.