Atsuko Ogura

Title: Atsuko Ogura: Innovator in Silicon Carbide Technology

Introduction

Atsuko Ogura is a prominent inventor based in Nara, Japan. She has made significant contributions to the field of semiconductor technology, particularly in silicon carbide devices. With a total of 2 patents, her work has garnered attention for its innovative approaches and practical applications.

Latest Patents

Atsuko Ogura's latest patents include a silicon carbide semiconductor device and a MIS structure photosensor. The silicon carbide semiconductor device features a heterojunction composed of two different polytypes of silicon carbide. This design includes a β-type silicon carbide layer with an α-type silicon carbide layer disposed on top. The MIS structure photosensor utilizes a photoconductive amorphous silicon carbide layer as an insulator layer. This insulator layer is placed on an n-type layer of single crystal silicon carbide, with a translucent metal layer above it. The metal layer is biased with a negative voltage, allowing the capacitance between the metal layer and the semiconductor layer to change in response to light illumination.

Career Highlights

Atsuko Ogura has established herself as a key figure in her field through her innovative work at Sharp Kabushiki Kaisha Corporation. Her expertise in semiconductor technology has led to advancements that benefit various applications in electronics and photonics.

Collaborations

Throughout her career, Atsuko has collaborated with notable colleagues, including Katsuki Furukawa and Mitsuhiro Shigeta. These partnerships have fostered a creative environment that encourages the development of cutting-edge technologies.

Conclusion

Atsuko Ogura's contributions to silicon carbide technology exemplify her innovative spirit and dedication to advancing the field. Her patents reflect a commitment to enhancing semiconductor devices, making her a noteworthy inventor in the industry.