Osaka, Japan

Atsuhiro Tanaka

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignees: Honda Motor Co., Ltd., Lintec Corporation. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Atsuhiro Tanaka. Retrieved from https://idiyas.com/inventor/atsuhiro-tanaka-k0mq00el

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: Atsuhiro Tanaka: Innovator in Protective Coating Technology

Introduction

Atsuhiro Tanaka is a notable inventor based in Osaka, Japan. He has made significant contributions to the field of protective coatings, particularly through his innovative patent. His work has implications for various industries, showcasing the importance of advancements in material science.

Latest Patents

Atsuhiro Tanaka holds a patent for a protective sheet for a coating film. This invention includes a substrate sheet and a pressure-sensitive adhesive layer. The protective sheet can be applied to a coated surface that is insufficiently cured immediately after drying. The pressure-sensitive adhesive layer is an addition reaction type silicone-based adhesive, which enhances the functionality of the protective sheet.

Career Highlights

Throughout his career, Tanaka has worked with prominent companies such as Lintec Corporation and Honda Motor Co., Ltd. His experience in these organizations has allowed him to develop and refine his innovative ideas in protective coating technologies.

Collaborations

Tanaka has collaborated with notable colleagues, including Fumio Hayakawa and Katsuhiko Ikeda. These partnerships have contributed to the advancement of his work and the successful implementation of his inventions.

Conclusion

Atsuhiro Tanaka's contributions to protective coating technology through his patent demonstrate his innovative spirit and dedication to improving material applications. His work continues to influence the industry and inspire future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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