Pittsburgh, PA, United States of America

Atreyie Ghosh

This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignees: Columbia University, University of Pittsburgh. Active years: 2026.

USPTO Granted Patents = 2 

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2026

Loading Chart...
2 patents (USPTO):Explore Patents

Title: Atreyie Ghosh: Innovator in Topological Plasmonics

Introduction

Atreyie Ghosh is a prominent inventor based in Pittsburgh, PA (US). He has made significant contributions to the field of plasmonics, particularly in the development of systems and methods for forming topological lattices of plasmonic merons. His innovative work has implications for advanced lithography techniques.

Latest Patents

Atreyie Ghosh holds 1 patent titled "Systems and methods for forming topological lattices of plasmonic merons." This patent discloses methods and systems for assembling electron spin and charge to possess properties of a topological plasmonic spin texture array. The invention aims to perform lithography that is not limited by the diffraction limit of optical systems. The method involves defining a polarization of an optical field of light and a corresponding coupling-structure geometry. It includes providing a coupling structure in a metallic material and directing light with the defined polarization to form a lattice of plasmonic merons, achieving finer contrast resolution than traditional methods.

Career Highlights

Atreyie Ghosh has worked at notable institutions, including the University of Pittsburgh and Columbia University. His research has focused on advancing the understanding and application of plasmonic materials in various technological fields.

Collaborations

Atreyie has collaborated with esteemed colleagues such as Hrvoje Petek and Zhikang Zhou. Their joint efforts have contributed to the advancement of research in plasmonics and related areas.

Conclusion

Atreyie Ghosh is a key figure in the field of plasmonics, with a focus on innovative methods for lithography. His contributions continue to influence the development of advanced technologies in this area.

Profile summary based on public USPTO records.
Please report any incorrect information to [email protected]
Loading…