The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 16, 2026
Filed:
Aug. 19, 2022
University of Pittsburgh—of the Commonwealth System of Higher Education, Pittsburgh, PA (US);
Hrvoje Petek, Pittsburgh, PA (US);
Zhikang Zhou, Pittsburgh, PA (US);
Atreyie Ghosh, Pittsburgh, PA (US);
Sena Yang, Pittsburgh, PA (US);
Tianyi Wang, Pittsburgh, PA (US);
Chen-Bin Huang, Hsinchu City, TW;
Yanan Dai, New York, NY (US);
University of Pittsburgh—Of the Commonwealth System of Higher Education, Pittsburgh, PA (US);
The Trustees of Columbia University In the City of New York, New York, NY (US);
Abstract
Methods and systems for assembling electron spin and charge to possess one or more properties of a topological plasmonic spin texture array for performing lithography that is not limited by an optical system's diffraction limit are disclosed. According to one embodiment, the method includes defining a polarization of an optical field of light and a corresponding coupling-structure geometry. The method includes providing a coupling structure having the defined coupling-structure geometry in a metallic material, the coupling structure defining a region of the metallic material. The method includes directing light having the defined polarization to a center of the region, forming a lattice of plasmonic merons having a finer contrast resolution than a diffraction or reflection based resolution determined by Abbe limit based on the defined polarization of the optical field.