Albuquerque, NM, United States of America

Ashwin Krishnan Rishinaramangalam

USPTO Granted Patents = 2 

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:

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Years Active: 2021-2024

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2 patents (USPTO):Explore Patents

Title: The Innovations of Ashwin Krishnan Rishinaramangalam

Introduction: Ashwin Krishnan Rishinaramangalam, an accomplished inventor based in Albuquerque, NM, has made significant strides in the field of semiconductor technology. His expertise lies in the development of wide-band-gap materials, which hold promise for various technological applications. With two patents to his name, Ashwin is recognized for his innovative contributions to scanning tunneling microscopy and lithography.

Latest Patents: Ashwin's latest patents focus on the provision of composite metal-wide-bandgap semiconductor tips for scanning tunneling microscopy and/or scanning tunneling lithography. These patents detail a method of forming and utilizing these advanced tips, which enhance the capabilities of microscopy and lithography techniques. His work is pivotal in pushing the boundaries of what is possible in the realm of nanotechnology and materials science.

Career Highlights: Throughout his career, Ashwin has been dedicated to advancing the field of semiconductor research. His patents demonstrate his commitment to innovation and his ability to address challenges within the industry. The impact of his work extends beyond his individual contributions, influencing the broader landscape of semiconductor technology.

Collaborations: Ashwin has had the opportunity to collaborate with notable professionals in his field, including Steven R J Brueck and Tito Busani. These collaborations have not only enriched his research but have also allowed for the sharing of ideas and techniques that drive innovation in semiconductor technologies.

Conclusion: Ashwin Krishnan Rishinaramangalam stands out as a notable inventor due to his innovative patents and collaborative work in the field of semiconductor technology. His contributions, particularly in developing advanced materials for scanning tunneling applications, reflect a deep commitment to enhancing the capabilities of scientific research and technological development. As he continues to push the boundaries of innovation, the impact of his work will likely resonate throughout the industry for years to come.

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