Santa Clara, CA, United States of America

Ashutosh Sawant

This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ashutosh Sawant. Retrieved from https://idiyas.com/inventor/ashutosh-sawant

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Ashutosh Sawant: Inventor in Semiconductor Processing

Introduction

Ashutosh Sawant is an inventor associated with Santa Clara, California, and Applied Materials, Inc. His patent work concerns equipment for clamping substrates during photoresist-film deposition.

Latest Patents

The provided information lists one patent for Sawant: “Apparatus for Clamping a Substrate on a Mono-Polar Electrostatic Chuck for Deposition of Photoresist Films.” The disclosed lift-pin assembly includes a first metal spring, a first metal coupled above it, a second metal spring coupled above the first metal, a second metal coupled above the second spring, and a ceramic component coupled above the second metal. The patent describes apparatuses designed to clamp a substrate on a mono-polar electrostatic chuck during photoresist-film deposition. Sawant is credited with 1 patent.

Career Highlights

Sawant’s listed invention addresses substrate clamping in semiconductor processing equipment. The patent’s layered lift-pin assembly combines metal springs, metal components, and ceramic, reflecting a focus on the apparatus used in photoresist deposition.

Collaborations

The provided information identifies Sushim Koshti as Sawant’s coworker at Applied Materials, Inc.

Conclusion

Ashutosh Sawant’s documented patent work centers on a lift-pin assembly for substrate clamping during photoresist-film deposition, connecting his invention to semiconductor manufacturing equipment.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…