Ashutosh Agarwal

Title: Ashutosh Agarwal: Innovator in Atomic Layer Deposition Technology

Introduction

Ashutosh Agarwal is a notable inventor based in Rajasthan, India. He has made significant contributions to the field of atomic layer deposition technology. His innovative work has led to the development of a patent that enhances substrate processing in various applications.

Latest Patents

Agarwal holds a patent for "Lids and lid assembly kits for atomic layer deposition chambers." This invention provides an apparatus for processing a substrate. In some embodiments, the lid for a substrate processing chamber includes a lid plate with an upper surface and a contoured bottom surface. The upper surface features a central opening, while the contoured bottom surface has a first portion that extends downwardly and outwardly from the central opening to the peripheral portion of the lid plate. Additionally, a second portion extends radially outward along the peripheral portion of the lid plate. The design also includes an upper flange extending radially outward from the lid plate and one or more channels formed through the lid plate from the upper surface to the second portion of the contoured bottom surface. This patent showcases Agarwal's expertise and innovation in the field.

Career Highlights

Agarwal is currently employed at Applied Materials, Inc., a leading company in the semiconductor and display industries. His role involves working on advanced technologies that drive innovation in substrate processing. His contributions have been instrumental in enhancing the efficiency and effectiveness of atomic layer deposition processes.

Collaborations

Agarwal has collaborated with notable colleagues, including Muhammad M Rasheed and Srinivas Gandikota. These collaborations have fostered a creative environment that encourages the exchange of ideas and advancements in technology.

Conclusion

Ashutosh Agarwal is a distinguished inventor whose work in atomic layer deposition technology has made a significant impact. His patent and contributions at Applied Materials, Inc. reflect his commitment to innovation and excellence in the field.