The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 19, 2024
Filed:
Apr. 28, 2021
Applied Materials, Inc., Santa Clara, CA (US);
Muhammad M. Rasheed, San Jose, CA (US);
Srinivas Gandikota, Santa Clara, CA (US);
Mario Dan Sanchez, San Jose, CA (US);
Guoqiang Jian, San Jose, CA (US);
Yixiong Yang, Santa Clara, CA (US);
Deepak Jadhav, Hubli, IN;
Ashutosh Agarwal, Rajasthan, IN;
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Abstract
Apparatus for processing a substrate are provided herein. In some embodiments, a lid for a substrate processing chamber includes: a lid plate comprising an upper surface and a contoured bottom surface, the upper surface having a central opening and the contoured bottom surface having a first portion that extends downwardly and outwardly from the central opening to a peripheral portion of the lid plate and a second portion that extends radially outward along the peripheral portion of the lid plate; an upper flange extending radially outward from the lid plate; and one or more channels formed through the lid plate from the upper surface of the lid plate to the second portion of the contoured bottom surface.