Applied Materials, Inc.

Ashutosh Agarwal

Srinivas Gandikota

Muhammad M Rasheed

Yixiong Yang

Mario Dan Sanchez

Guoqiang Jian

Deepak Jadhav

Apparatus for processing a substrate are provided herein. In some embodiments, a lid for a substrate processing chamber includes: a lid plate comprising an upper surface and a contoured bottom surface, the upper surface having a central opening and the contoured bottom surface having a first portion that extends downwardly and outwardly from the central opening to a peripheral portion of the lid plate and a second portion that extends radially outward along the peripheral portion of the lid plate; an upper flange extending radially outward from the lid plate; and one or more channels formed through the lid plate from the upper surface of the lid plate to the second portion of the contoured bottom surface.

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Rajasthan, India

Ashutosh Agarwal