This inventor holds 5 USPTO granted patents. Top assignee: Applied Materials, Inc.. Active years: 1998-2002.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Albuquerque, NM (US) (1999)
- Santa Clara, CA (US) (1998 - 2002)
Company Filing History:
Years Active: 1998-2002
Title: Ashish V Shrotriya: Innovator in Semiconductor Processing
Introduction
Ashish V Shrotriya is a notable inventor based in Santa Clara, CA (US). He has made significant contributions to the field of semiconductor processing, holding a total of 5 patents. His work focuses on innovative methods and devices that enhance the efficiency and effectiveness of semiconductor manufacturing.
Latest Patents
One of his latest patents is titled "Film removal employing a remote plasma source." This invention provides a method and device for removing film from a substrate by utilizing a remote plasma source to etch away undesired portions of films, such as dielectric films formed on a substrate. The method involves forming a plasma remotely from the process chamber, creating a flow directed toward the substrate. The substrate has opposed major surfaces with a peripheral surface extending between them. A film, such as a dielectric film, is disposed on one of the major surfaces and the peripheral surface. The major surface with the film is shielded from the flow of reactive radicals, while the peripheral surface remains exposed, allowing for effective film removal.
Another significant patent is "Gas feedthrough with electrostatic discharge characteristic." This invention describes a gas feedthrough in a semiconductor processing apparatus made from a static-dissipative composite material. This material exhibits good resistance to electromigration and is designed to prevent the transfer of energy to a gas flowing through a gas line. The feedthrough has a first end that contacts an electrically energized member and a second end that contacts a grounded member, with a void along its length to house the gas line.
Career Highlights
Ashish V Shrotriya is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His work at Applied Materials has allowed him to develop and patent innovative technologies that contribute to advancements in semiconductor processing.
Collaborations
Throughout his career, Ashish has collaborated with notable colleagues, including Todd C Bryant and Bok Heon Kim. These collaborations have further enriched his work and contributed to the development of cutting-edge technologies in the field.
Conclusion
Ashish V Shrotriya is a prominent inventor whose contributions to semiconductor processing have led to several important patents. His innovative approaches continue to shape the industry and enhance manufacturing processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
