The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 09, 2001
Filed:
Apr. 13, 1999
Kuo-Shih Liu, Milpitas, CA (US);
Ernest Cheung, Cupertino, CA (US);
Prasanth Kumar, Fremont, CA (US);
John Ferguson, Oakland, CA (US);
Michael G. Friebe, Santa Clara, CA (US);
Ashish Shrotriya, Santa Clara, CA (US);
William Nixon Taylor, Jr., Dublin, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A gas feedthrough in a semiconductor processing apparatus comprises a static-dissipative composite material. This material is characterized by good resistance to electromigration and is preferably made of a homogeneous material. This apparatus for preventing the transfer of energy to a gas flown through a gas line and comprises a gas feedthrough comprising a static-dissipative material, the feedthrough having a first end for abuttingly contacting an electrically energized member and a second end for contacting a grounded member, the feedthrough defining a void therein along its length to house a gas line.