Boise, ID, United States of America

Ashim Dutta

This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignee: Micron Technology Incorporated. Active years: 2017-2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ashim Dutta. Retrieved from https://idiyas.com/inventor/ashim-dutta-zc6j1ile

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 2 

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2017-2018

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2 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Ashim Dutta

Introduction

Ashim Dutta is a notable inventor based in Boise, Idaho. He has made significant contributions to the field of semiconductor technology, holding two patents that showcase his innovative approach to construction designs. His work is instrumental in advancing the capabilities of semiconductor devices.

Latest Patents

Dutta's latest patents focus on semiconductor constructions. Some embodiments include a construction having conductive structures spaced from one another by intervening regions. Insulative structures are incorporated within these intervening regions, which include dielectric spacers and air gaps between the dielectric spacers. The dielectric capping material is strategically placed over the air gaps and is positioned between the dielectric spacers, avoiding coverage of the upper surfaces of the dielectric spacers. Additionally, some embodiments feature a first conductive structure with an upper surface, along with multiple second conductive structures that are electrically coupled to the first structure's upper surface. These second structures are also spaced apart by intervening regions, which contain air gap/spacer insulative structures. These structures have dielectric spacers along the sidewalls of the second conductive structures and air gaps between the dielectric spacers, with dielectric capping material placed over the air gaps.

Career Highlights

Ashim Dutta is currently employed at Micron Technology Incorporated, a leading company in the semiconductor industry. His role involves developing innovative solutions that enhance semiconductor performance and efficiency. Dutta's expertise in semiconductor constructions has positioned him as a valuable asset to his team and the company.

Collaborations

Dutta collaborates with talented coworkers, including Mohd Kamran Akhtar and Shane J Trapp. Their combined efforts contribute to the advancement of semiconductor technologies and foster a collaborative environment that encourages innovation.

Conclusion

Ashim Dutta's contributions to semiconductor technology through his patents and work at Micron Technology Incorporated highlight his role as an influential inventor. His innovative designs and collaborative spirit continue to drive advancements in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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