Portland, OR, United States of America

Asher Klatchko


Average Co-Inventor Count = 3.4

ph-index = 2

Forward Citations = 30(Granted Patents)


Company Filing History:


Years Active: 2004-2009

Loading Chart...
5 patents (USPTO):Explore Patents

Title: Asher Klatchko: Innovator in Optical Proximity Correction

Introduction

Asher Klatchko, an accomplished inventor based in Portland, OR, has made significant contributions to the field of optical proximity correction. With a total of five patents to his name, he is recognized for his innovative approaches to enhancing lithography processes in printing technology.

Latest Patents

Among his latest patents, Klatchko has developed techniques focused on optical proximity correction in raster scan printing. His first patent provides methods and apparatus for correcting defects, such as rounded corners and line end shortening, in patterns formed via lithography. These defects are compensated for 'post-rasterization' through the manipulation of grayscale values in pixel maps. The second patent follows a similar theme, again addressing optical proximity correction but specifically regarding grayscale manipulation of the bitmap. These advancements are critical in refining the quality of printed patterns in various applications.

Career Highlights

Asher Klatchko is currently employed at Applied Materials, Inc., a leading company in the development of equipment and systems for the manufacturing of semiconductor products. His work has not only propelled his career but has also reinforced the company’s reputation for innovation in technology.

Collaborations

In his professional journey, Klatchko has collaborated with notable colleagues such as Peter Pirogovsky and Matthew J Jolley. Together, they have shared insights and expertise, contributing to the advancement of their field and supporting each other's innovative projects.

Conclusion

With a robust portfolio of patents and a strong collaborative network, Asher Klatchko stands out as a significant figure in the realm of optical proximity correction. His work continues to influence the efficiency and quality of lithography processes, marking him as a valuable inventor in the technology landscape.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…