The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 05, 2009

Filed:

Jul. 01, 2004
Applicants:

Robert J. Beauchaine, Gaston, OR (US);

Thomas E. Chabreck, Tigard, OR (US);

Samuel C. Howells, Portland, OR (US);

John J. Hubbard, Lake Oswego, OR (US);

Asher Klatchko, Portland, OR (US);

Peter Pirogovsky, Portland, OR (US);

Robin L. Teitzel, Portland, OR (US);

Inventors:

Robert J. Beauchaine, Gaston, OR (US);

Thomas E. Chabreck, Tigard, OR (US);

Samuel C. Howells, Portland, OR (US);

John J. Hubbard, Lake Oswego, OR (US);

Asher Klatchko, Portland, OR (US);

Peter Pirogovsky, Portland, OR (US);

Robin L. Teitzel, Portland, OR (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01); G06K 9/46 (2006.01); G06K 9/62 (2006.01);
U.S. Cl.
CPC ...
Abstract

Methods and apparatus for correcting defects, such as rounded corners and line end shortening, in patterns formed via lithography are provided. Such defects are compensated for 'post-rasterization' by manipulating the grayscale values of pixel maps.


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