Tel Aviv, Israel

Aryeh Heilprin

This inventor holds 1 USPTO granted patent. Top assignee: Nuvoton Technology Corporation. Active years: 2019.


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: Aryeh Heilprin: Innovator in Integrated Circuit Design

Introduction

Aryeh Heilprin is a notable inventor based in Tel Aviv, Israel. He has made significant contributions to the field of integrated circuit design, particularly through his innovative patent.

Latest Patents

Heilprin holds a patent for a "System, method and computer product for enhanced decoupling capacitor implementation." This patent describes a method for designing an integrated circuit die, which includes generating a first layout for the die that features at least one decoupling capacitor (decap). The method further involves performing a post-processing decap insertion operation to add at least one additional decap beyond the initial design. This operation identifies candidate locations within the layout that have positive slack and inserts additional decaps at these locations, enhancing the overall performance of the integrated circuit.

Career Highlights

Heilprin is currently employed at Nuvoton Technology Corporation, where he continues to apply his expertise in integrated circuit design. His work has contributed to advancements in the efficiency and effectiveness of electronic components.

Collaborations

Heilprin collaborates with talented professionals in his field, including Arnon Sharlin and Rafael Eliezer Diaz. Their combined efforts foster innovation and drive progress in technology.

Conclusion

Aryeh Heilprin's contributions to integrated circuit design through his patent demonstrate his commitment to innovation in the technology sector. His work at Nuvoton Technology Corporation and collaborations with fellow professionals highlight his role as a key figure in advancing electronic design methodologies.

Profile summary based on public USPTO records.
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