Madison, NJ, United States of America

Arunava Gupta

This inventor holds 7 USPTO granted patents. Top assignee: Allied Corporation. Active years: 1984-1988.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Arunava Gupta. Retrieved from https://idiyas.com/inventor/arunava-gupta-eljs1n0u

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.6

ph-index = 6

Forward Citations = 141(Granted Patents)


Company Filing History:


Years Active: 1984-1988

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7 patents (USPTO):Explore Patents

Title: Innovator Arunava Gupta: Pioneering Advances in Metal Silicide Production

Introduction

Arunava Gupta, a prolific inventor based in Madison, NJ, has made significant contributions to the field of material science, particularly in the production of ultrafine powders and conductive films. With a remarkable portfolio of seven patents, Gupta's work focuses on innovations that enhance the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

Gupta's latest patents exhibit cutting-edge methodologies that have the potential to revolutionize the production of conductive materials. One notable patent is the "Light Induced Production of Ultrafine Powders Comprising Metal Silicide." This invention discloses a method for producing ultrafine powders that are particularly suited for forming stable colloidal suspensions. The process involves exposing gaseous reactants, consisting of a metal halide and a silicon-containing compound, to high-intensity light, resulting in ultrafine powders ideal for use in VLSI (Very-Large-Scale Integration) and VVLSI (Ultra-Very-Large-Scale Integration) production.

Another significant patent is the "Production of Conductive Metal Silicide Films from Ultrafine Powders." This method simplifies the creation of thin films comprising conductive metal silicide while minimizing substrate damage by maintaining processing temperatures at 1,000 degrees Celsius or less. The described process utilizes a stable suspension of ultrafine powders in a solvent, which is then deposited onto a substrate and heated to form a durable, thin conductive film. These innovations are particularly advantageous for applications in advanced semiconductor technology.

Career Highlights

Arunava Gupta currently works at Allied Corporation, where he continues to advance his research in material sciences. His career is characterized by a commitment to developing novel solutions that address industry challenges, particularly in the electronics and semiconductor sectors. His expertise in producing sophisticated materials has earned him recognition among peers and industry leaders alike.

Collaborations

Throughout his career, Gupta has collaborated with esteemed colleagues, including Gary A. West and James T. Yardley. These partnerships have fostered a productive environment for innovation, allowing Gupta to leverage diverse expertise and push the boundaries of what is possible in material production and application.

Conclusion

Arunava Gupta stands out as a leading inventor in the realm of metal silicide production. His latest patents not only highlight his innovative spirit but also underscore the importance of developing advanced materials for the semiconductor industry. As Gupta continues his work at Allied Corporation, the impact of his inventions promises to be transformative, paving the way for future advancements in technology and manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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