Karnataka, India

Arun Rengaraj

This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Arun Rengaraj. Retrieved from https://idiyas.com/inventor/arun-rengaraj

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Innovations by Arun Rengaraj in Substrate Processing Technology.

Introduction

Arun Rengaraj is a notable inventor based in Karnataka, India. He has made significant contributions to the field of substrate processing technology. His innovative work focuses on enhancing the efficiency and effectiveness of substrate processing systems.

Latest Patents

Arun Rengaraj holds a patent for a Multi-chamber substrate processing platform. This invention discloses substrate processing systems or platforms and methods configured to process substrates, including extreme ultraviolet (EUV) mask blanks. The systems provide a small footprint, high throughput of substrates, and minimize defect generation. The substrate processing system platform comprises a single central transfer chamber, a single transfer robot, a substrate flipping fixture, and processing chambers positioned around the central transfer chamber.

Career Highlights

Arun Rengaraj is currently employed at Applied Materials, Inc. His work at this leading company in materials engineering has allowed him to develop and refine his innovative ideas in substrate processing technology.

Collaborations

Some of his coworkers include Ribhu Gautam and Vibhu Jindal. Their collaboration has contributed to the advancement of technology in their field.

Conclusion

Arun Rengaraj's contributions to substrate processing technology exemplify the impact of innovation in the industry. His patent reflects a commitment to improving processing systems, which can lead to significant advancements in manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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