The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 02, 2024

Filed:

Dec. 21, 2020
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Ribhu Gautam, Singapore, SG;

Vibhu Jindal, San Jose, CA (US);

Sanjay Bhat, Singapore, SG;

Praveen Kumar Choragudi, Andhra Pradesh, IN;

Vinodh Ramachandran, Singapore, SG;

Arun Rengaraj, Karnataka, IN;

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); G03F 1/24 (2012.01); H01L 21/687 (2006.01); B65G 47/90 (2006.01); C23C 14/06 (2006.01); C23C 14/56 (2006.01); C23C 14/58 (2006.01); C23C 14/35 (2006.01);
U.S. Cl.
CPC ...
G03F 1/24 (2013.01); B65G 47/90 (2013.01); C23C 14/0641 (2013.01); C23C 14/35 (2013.01); C23C 14/566 (2013.01); C23C 14/568 (2013.01); C23C 14/5806 (2013.01); H01L 21/67167 (2013.01); H01L 21/67196 (2013.01); H01L 21/67201 (2013.01); H01L 21/67207 (2013.01); H01L 21/68707 (2013.01); H01L 21/68742 (2013.01); H01L 21/68764 (2013.01);
Abstract

Substrate processing systems or platforms and methods configured to process substrates including of extreme ultraviolet (EUV) mask blanks are disclosed. Systems or platforms provide a small footprint, high throughput of substrates and minimize defect generation. The substrate processing system platform comprises a single central transfer chamber, a single transfer robot, a substrate flipping fixture, and processing chambers are positioned around the single central transfer chamber.


Find Patent Forward Citations

Loading…