Company Filing History:
Years Active: 2010
Title: Innovations by Arun Paneerselvam in Vacuum Technology.
Introduction
Arun Paneerselvam is a notable inventor based in White Plains, NY (US). He has made significant contributions to the field of vacuum technology, particularly with his innovative approach to debris removal systems. His work focuses on enhancing the efficiency and safety of processes that involve photoablation.
Latest Patents
Arun holds a patent for a "Vacuum debris removal system." This invention features a turbulence-controlled vacuum debris removal subsystem that safely exhausts particles ejected during photoablation. The system utilizes nested interconnected chambers that provide diminishing sweeping gas partial pressure and turbulence. This design effectively ejects particles from the ablation beam path between pulses, ensuring that particle conductance is maintained. The removal rate of debris is influenced by conductance and particle sizes. The chambers interconnect through metering holes, allowing for the optimization of partial pressure differentials. Controlled flow is essential for accomplishing debris removal while reducing turbulence in the mixture of debris and sweeping gases. A preferred embodiment of the invention employs a nest of concentric chambers, which ensures a clear light path. Another embodiment utilizes orifices on chamber faces to facilitate removal and create a gas envelope around the processing region, dynamically containing the ejected particulate matter from the ablation site to the exhaust.
Career Highlights
Arun Paneerselvam is associated with Anvik Corporation, where he continues to develop and refine his innovative technologies. His work has positioned him as a key figure in the advancement of vacuum systems used in various applications.
Collaborations
Arun collaborates with talented individuals such as Leszek Wojcik and Diwakar Kedlaya. Their combined expertise contributes to the success of their projects and the development of cutting-edge technologies.
Conclusion
Arun Paneerselvam's contributions to vacuum technology, particularly through his patented debris removal system, highlight his innovative spirit and dedication to improving safety and efficiency in photoablation processes. His work continues to influence the field and inspire future advancements.