This inventor holds 1 USPTO granted patent. Top assignee: Nanometrics Inc.. Active years: 2004.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2004
Title: Arosha W Goonesekera: Innovator in Precision Technology
Introduction
Arosha W Goonesekera is a prominent inventor based in Lincoln, NE (US). She has made significant contributions to the field of precision technology, particularly through her innovative patent. Her work exemplifies the intersection of engineering and practical application in the industry.
Latest Patents
Arosha holds a patent for a "High precision substrate prealigner." This invention includes a light source and a light detector that accurately detects the position of the periphery of a substrate as a rotary chuck rotates it. The prealigner features a processor that records the peripheral position of the substrate relative to its angular position. By fitting a curve to the recorded data set, the prealigner determines the center of the substrate while eliminating any data spikes caused by notches or parts of the chuck. The position of the notch is also determined through curve fitting, allowing for precise calculations of the mid-point and offset error.
Career Highlights
Arosha's career is marked by her dedication to advancing technology in substrate alignment. Her innovative approach has led to the development of tools that enhance accuracy in various applications. She is currently associated with Nanometrics Inc., where she continues to push the boundaries of precision technology.
Collaborations
Arosha has worked alongside notable colleagues, including Blaine R Spady and William A McGahan. Their collaborative efforts have contributed to the success of her projects and the advancement of technology in their field.
Conclusion
Arosha W Goonesekera is a trailblazer in precision technology, with her patent for a high precision substrate prealigner showcasing her innovative spirit. Her contributions continue to impact the industry positively.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
