This inventor holds 2 USPTO granted patents. Top assignees: U.S. Philips Corporation, X-Ray Research Gmbh. Active years: 1987-2004.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1987-2004
Title: Arno Lentfer: Innovator in X-ray Lithography
Introduction
Arno Lentfer is a notable inventor based in Hamburg, Germany. He has made significant contributions to the field of X-ray lithography, holding a total of 2 patents. His work has been instrumental in advancing technologies that utilize goniometers and specialized masks for lithographic processes.
Latest Patents
Lentfer's latest patents include an "Automatic adjusting method for a goniometer" and a "Mask with magnesium diaphragm for X-ray lithography." The latter patent describes a mask formed of a multilayer diaphragm with a patterned absorber layer. This innovative diaphragm includes a layer of magnesium and at least one intermediate layer, enhancing the precision and effectiveness of X-ray lithography.
Career Highlights
Throughout his career, Arno Lentfer has worked with prominent companies such as U.S. Philips Corporation and X-ray Research GmbH. His experience in these organizations has allowed him to develop and refine his inventions, contributing to advancements in the field.
Collaborations
Lentfer has collaborated with various professionals, including his coworker Holger K. Luthje. These partnerships have fostered innovation and the exchange of ideas, further enhancing the impact of his work.
Conclusion
Arno Lentfer's contributions to the field of X-ray lithography and his innovative patents demonstrate his commitment to advancing technology. His work continues to influence the industry and inspire future innovations.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile