The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 1987
Filed:
Jan. 24, 1986
Applicant:
Inventors:
Arno Lentfer, Hamburg, DE;
Holger Luthje, Halstenbek, DE;
Assignee:
U.S. Philips Corporation, New York, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21K / ; G03F / ;
U.S. Cl.
CPC ...
430-5 ; 378 35 ; 430967 ;
Abstract
A mask for X-ray lithography is formed of a multilayer diaphragm with a patterned absorber layer on the diaphragm. The diaphragm includes a layer of magnesium and at least one intermediate layer.
Lentfer, Arno. (1987). Mask with magnesium diaphragm for x-ray lithography (U.S. Patent No. 4701391). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4701391
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile