This inventor holds 1 USPTO granted patent. Top assignee: Technische Universiteit. Active years: 2007.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2007
Title: Arno Hendrikus Marie Smets: Innovator in Silicon Layer Deposition
Introduction
Arno Hendrikus Marie Smets is a notable inventor based in Maasbree, Netherlands. He has made significant contributions to the field of materials science, particularly in the deposition of silicon layers. His innovative work has led to the development of a unique process that enhances the quality of silicon layers used in various applications.
Latest Patents
Arno Smets holds a patent for a "Process and device for the deposition of an at least partially crystalline silicon layer on a substrate." This patent describes a method where a plasma is generated, and a substrate is exposed to a silicon-containing source fluid for the deposition of silicon. A pressure drop is applied between the source fluid supply location and the substrate. Additionally, an auxiliary fluid is injected to etch non-crystalline silicon atoms, allowing for a more efficient deposition process.
Career Highlights
Arno Smets is affiliated with Technische Universiteit, where he continues to engage in research and development. His work focuses on advancing techniques in silicon layer deposition, which is crucial for various technological applications, including electronics and solar cells.
Collaborations
Arno has collaborated with esteemed colleagues such as Edward Aloys Gerard Hamers and Mauritius Cornelius Maria Van De Sanden. These collaborations have further enriched his research and contributed to advancements in the field.
Conclusion
Arno Hendrikus Marie Smets is a prominent figure in the innovation of silicon layer deposition processes. His patent and ongoing research at Technische Universiteit highlight his commitment to advancing materials science. His contributions are expected to have a lasting impact on various technological fields.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile