Singapore, Singapore

Arjun Kumar Kantimahanti

This inventor holds 2 USPTO granted patents. Top assignee: Chartered Semiconductor Manufacturing Ltd (Corporation). Active years: 1998-2001.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Arjun Kumar Kantimahanti. Retrieved from https://idiyas.com/inventor/arjun-kumar-kantimahanti-xq6a5j57

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.4

ph-index = 1

Forward Citations = 12(Granted Patents)


Company Filing History:


Years Active: 1998-2001

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2 patents (USPTO):Explore Patents

Title: Arjun Kumar Kantimahanti: Innovator in Integrated Circuit Fabrication

Introduction

Arjun Kumar Kantimahanti is a notable inventor based in Singapore, recognized for his contributions to the field of integrated circuit fabrication. He holds 2 patents that showcase his innovative approaches to improving semiconductor technology. His work has significant implications for the efficiency and performance of electronic devices.

Latest Patents

Kantimahanti's latest patents include a method to form a smooth gate polysilicon sidewall in the fabrication of integrated circuits. This method describes a process for creating gate structures with smooth sidewalls by amorphizing the polysilicon along the gate boundaries. The result is minimal gate depletion effects and improved critical dimension control in smaller devices. The process involves providing a gate silicon oxide layer on the semiconductor substrate, depositing a gate electrode layer, and using ion implantation to amorphize the polysilicon. The amorphized silicon is then removed, leaving a narrow area on the gate electrode sidewalls, thus completing the gate structure.

Another significant patent involves the formation of capacitors using a sacrificial etch stop. This method allows for the concurrent fabrication of capacitors with interconnection wiring levels, requiring only a single additional photolithographic step and two depositions. A key feature of this invention is the use of an etch-stop to protect the capacitor dielectric during etching processes. This technique is particularly beneficial for the manufacture of logic circuits and can be effectively utilized in MOSFET, bipolar, and BiCMOS processes.

Career Highlights

Kantimahanti is currently employed at Chartered Semiconductor Manufacturing Ltd, where he continues to advance his research and development efforts in semiconductor technology. His innovative methods have contributed to the efficiency and effectiveness of integrated circuit production.

Collaborations

Throughout his career, Kantimahanti has collaborated with notable colleagues, including Chivukula Subrahmanyam and Mei Sheng Zhou. These collaborations have further enriched his work and expanded the impact of his inventions in the field.

Conclusion

Arjun Kumar Kantimahanti is a distinguished inventor whose work in integrated circuit fabrication has led to significant advancements in semiconductor technology. His innovative patents reflect his commitment to improving electronic device performance and efficiency.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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